Chip-Scale Extreme Ultraviolet Nanophotonic Light Sources

About the project

About the Project This PhD project will focus on the development of chip-scale extreme ultraviolet (EUV) light sources based on electron-excited nanophotonic structures. The project aims to design, fabricate, and characterize compact EUV emitter architectures by integrating advanced cathode/anode materials, multilayer nanostructures, vacuum microcavities, and meta-optical design principles. The student will work on the physics and engineering of electron-matter interaction, EUV photon generation, device integration, and optical/electrical characterization. The project will contribute to next-generation compact EUV technologies with potential impact in nanolithography, nanoscale metrology, semiconductor manufacturing, and advanced photonic systems. Candidates with strong backgrounds in one or more of the following areas are encouraged to apply: • A strong background in electrical and electronic engineering, applied physics, materials science, photonics, or a related discipline • Prior experience in nanofabrication, vacuum systems, electron-beam systems, semiconductor devices, optical characterization, thin-film deposition, or numerical simulations • Motivation to work on interdisciplinary experimental research involving device fabrication, characterization, and modelling This project is aligned with ongoing research activities in chip-scale EUV nanophotonics and will involve close interaction with researchers working on nanofabrication, electron-beam excitation, vacuum-device engineering, and advanced optical characterization.

Research areas